Microchemical component and balancing method

ABSTRACT

The invention creates a micromechanical component, in particular a pressure sensor, comprising: a substrate ( 2 ) that has a membrane region ( 10 ) and a surrounding region of the membrane region ( 10 ); at least one measuring resistance ( 4   a   , 4   b   ; 41, 42 ) provided in the membrane region ( 10 ) and modifiable by deformation of the membrane region ( 10 ); a corresponding evaluation circuit ( 50 ) provided in the surrounding region, an interference effect on the measuring resistance ( 4   a   , 4   b   ; 41, 42 ) being producible by way of a deformation of parts, in particular conductor paths, of the evaluation circuit ( 50 ) relative to the substrate ( 2 ); and at least one patch ( 60; 70, 70 ′) provided in the surrounding region and/or in the membrane region ( 10 ) and made of a material such that by way of a deformation of the patch or patches ( 60 ) relative to the substrate ( 2 ), an analog interference effect can be generated in such a way that the interference effect acting on the measuring resistance ( 4   a   , 4   b   ; 41, 42 ) can be compensated for. The invention also creates a corresponding equalization method on a test chip or as an individual final equalization.

BACKGROUND OF THE INVENTION

[0001] The present invention concerns a micromechanical component, in particular a pressure sensor, comprising: a substrate that has a membrane region and a surrounding region of the membrane region; at least one measuring resistance provided in the membrane region and modifiable by deformation of the membrane region; and a corresponding evaluation circuit provided in the surrounding region, an interference effect on the measuring resistance being producible by way of a deformation of parts, in particular conductor paths, of the evaluation circuit relative to the substrate. The invention also concerns a corresponding equalization method.

[0002] Although applicable in principle to any micromechanical components, the present invention and the problem on which it is based will be explained with reference to a micromechanical pressure sensor.

[0003] DE 197 01 055 A1 discloses a semiconductor pressure sensor for measuring an externally applied pressure. FIG. 7 shows a plan view of this known pressure sensor. A sectioned drawing of this pressure sensor along section line A-A′ is shown in FIG. 8. The pressure sensor is manufactured on a substrate 2 made of silicon which has a (100) orientation. Located on the underside of a membrane 10 is a depression in the shape of a truncated pyramid. Its configuration is such that at the location of the truncated pyramid, only a small residual thickness of silicon material (membrane 10) remains. The delimiting lines of the truncated pyramid are drawn with dashes in FIG. 7 and run parallel to the [110] and [110] directions, whose orientation is indicated in FIG. 7 with arrows 40 and 41. The portion of silicon substrate 2 that is not thinned is also called support 11.

[0004] A measuring resistance 4 that extends in the [110] direction is located on membrane 10 close to the membrane edge. Two electrodes 6, which are made of vacuum-deposited aluminum in the exemplified embodiment selected here, are located on support 11; one electrode is configured in front of and one behind measuring resistance 4, as a respective elongated metallization extending perpendicular to measuring resistance 4. A compensating resistance 5 is located at the left electrode, extending perpendicular to the direction of measuring resistance 4 in the [110] direction. Compensating resistance 5 is connected at one end to measuring resistance 4 via a connecting conductor 7, and at its other end to electrode 6 via a second connecting conductor 7. Double arrows 30 and 31 indicate mechanical stresses that are relevant in terms of explaining the manner of operation of this known pressure sensor with hysteresis balancing.

[0005]FIG. 8 shows a cross section through the pressure sensor of FIG. 7. Substrate 2 has a depression that is trapezoidal in cross section and is delimited by support 11 and membrane 10. Measuring resistance 4 is located in the surface of membrane 10. Measuring resistance 4 is implemented by introducing a local doping zone into the silicon material.

[0006] The manner of operation of the known pressure sensor with hysteresis balancing is as follows. The pressure sensor is mechanically deformed by a pressure acting externally on the pressure sensor. The thickness of support 11 is typically several hundreds of micrometers, whereas the thickness of membrane 10 is typically several micrometers. Because of the resulting difference in stiffness, the mechanical deformation in support 11 is negligible compared to the mechanical deformation in the membrane. The mechanical stress or deformation resulting from the externally applied pressure is illustrated by an arrow 31, whose length is an indication of the deformation. The mechanical deformation is depicted by way of example at a point, namely at the location of measuring resistance 4.

[0007] Also present in the pressure sensor is a first deformation 30 whose cause is a mechanical interference stress which in the present case is based on the differing coefficients of thermal expansion of the aluminum of the electrodes and the silicon of substrate 2. A first mechanical stress or deformation 30 of this kind can be associated with each point in the pressure sensor, but only two points in the pressure sensor will be considered. These two points are assumed to be the location of measuring resistance 4 and the location of compensating resistance 5. In the exemplified embodiment selected here, it is assumed that first deformation 30 is identical everywhere.

[0008] Measuring resistance 4 and compensating resistance 5 are dimensioned so that their piezoresistive coefficients are of identical magnitude. The absolute electrical resistance values are also assumed to be identical under identical external conditions. The changes in electrical resistance in measuring resistance 4 and in compensating resistance 5 as a result of first deformation 30 are thus of identical magnitude. But because one resistance is positioned in the direction of the deformation and one perpendicular to the deformation, the two changes in resistance have different signs. The total change in resistance resulting from first deformation 30 in the equivalent resistance for the series circuit made up of measuring resistance 4 and compensating resistance 5 is therefore zero. All that remains, therefore, is the change in the measuring resistance as a result of second deformation 31, to which compensating resistance 5 (located on support 11) is not exposed.

[0009] The known approach to compensating for hysteresis described above has proven to be disadvantageous in that it exhibits only low efficiency and results in a loss of sensitivity.

[0010] In the known integrated micromechanical pressure sensor, without compensation a hysteresis of the output signal over temperature therefore generally occurs at the converter element. The hysteresis is generally brought about by a plastic deformation of the aluminum conductor paths of the evaluation circuit, which are located in the surrounding region on support 11. If the sensor element is heated to above ΔT=60 degrees C., the differing coefficients of thermal expansion of aluminum and the silicon substrate cause mechanical stresses of 100 MPa to occur in the aluminum. Above these stress levels, the aluminum begins to flow. Upon cooling, the same happens in the opposite direction.

[0011]FIG. 9 illustrates this hysteresis of the mechanical stress as a function of temperature, and FIG. 10 shows the hysteresis of a further known pressure sensor without compensation as a function of membrane edge length mk, for various circuit inner radii SIR. In contrast to the example above, it is assumed here that the circuit conductor paths of the evaluation circuit completely enclose the membrane. Chip size is 4 mm. The global effect predominates in the negative hysteresis region, and the edge effect in the positive hysteresis region.

[0012] The hysteretic behavior of the overall aluminum wiring of the evaluation circuit has an integral remote effect on the piezoresistances of the converter element, specifically by way of a “bimetallic deformation” (aluminum layer on silicon) of the overall sensor element (global effect), and by way of a local effect when the distance from the circuit edge to the piezoresistance is less than 100 micrometers (edge effect).

[0013] Depending on the geometric layout, either the global effect or the edge effect predominates. The essential influencing variables are:

[0014] a) Distance from membrane edge to edge of evaluation circuit

[0015] b) Membrane size

[0016] c) Chip geometry

[0017] d) Glass thickness, cut width of glass saw

[0018] e) Glass size

[0019] f) Solder thickness, adhesive thickness, mounting substrate

[0020] In sensors soldered on the back side, the hysteresis of the solder partially counteracts the influences caused by the top side of the chip (=aluminum wiring of the circuit). The hysteresis of the solder should therefore be taken into account for absolute hysteresis calculation.

[0021] Four measuring resistances are usually provided for the micromechanical pressure sensor, and are located (depending on type) in the region in which the edge effect or global effect is dominant. They are connected into a Wheatstone bridge whose output signal consequently also exhibits a temperature hysteresis. This temperature hysteresis overlies the actual sensor signal.

ADVANTAGES OF THE INVENTION

[0022] The micromechanical component according to the present invention having the features of claim 1 and the equalization method according to claim 9 have the advantage, as compared to known approaches, of exhibiting a high maximum compensation effect and a small minimum step size.

[0023] It should be possible to compensate for hysteresis levels exceeding 5% (both positive and negative) at the pressure converter element. The minimum step size should be 0.1% hysteresis.

[0024] No sensitivity loss, or only a minimizable sensitivity loss, occurs. Cross-coupling to the measuring resistance can be prevented. Lastly, the compensation function can be easily integrated into the circuit. Equalization by way of mask programming can be provided for. As an alternative, optimum compensation can be established on a precursor article.

[0025] The underlying idea of the present invention is to provide, in the surrounding region and/or in the membrane region, at least one patch which is made of a material such that by way of a deformation of the patch or patches relative to the substrate, an analog interference effect can be generated in such a way that the interference effect acting on the measuring resistance can be compensated for.

[0026] The dependent claims contain advantageous developments of and improvements to the subject matter of the invention described in claims 1 and 9.

[0027] According to a preferred development, a compensating resistance device is provided which is configured such that one or more compensating resistances can be additionally connected to the measuring resistance, respective patches being provided in the region of the compensating resistances. A positive or negative hysteresis is counteracted by additionally connecting one or more compensating resistances as necessary.

[0028] According to a further preferred development, additional connection of the compensating resistance or resistances can be performed selectably, so that from a defined number of compensating resistances, a specific combination that is to be additionally connected to the measuring resistance is selectable. This structure allows the exact compensation effect to be ascertained by severing conductor paths on the completely configured sensor. The structure can also be designed so that a specific compensation effect can be established by way of a mask change.

[0029] “Selectively additionally connectable” means that a connection is interrupted by severing conductor paths, or a connection is created by short-circuiting conductor paths. This can be effected e.g. by way of burnout segments (with a laser or voltage pulse) or by thyristor zapping. Individual end-of-line equalization for high-precision requirements is thus possible.

[0030] According to a further preferred development, one or more patches that act directly on the measuring resistance are provided in the membrane region.

[0031] According to a further preferred development, one or more preferably annular patches, which are located in the surrounding region between the membrane edge and the circuit inner radius of the evaluation circuit, are provided. A negative hysteresis is compensated for by way of the global effect that is controllable in this fashion. No compensating resistances are needed in this case. The “circuit inner radius” means the step between the circuit region and the surrounding region (e.g. A1 step).

[0032] According to a further preferred development, the material of the patches is the conductor path material of the evaluation circuit.

[0033] According to a further preferred development, the patches are located above or alongside an associated compensating resistance.

[0034] According to a further preferred development, the substrate material is silicon and the conductor path material is aluminum.

DRAWINGS

[0035] Exemplified embodiments of the invention are depicted in the drawings and explained in more detail in the description below. In the drawings:

[0036]FIG. 1 shows a portion of a micromechanical pressure sensor as a first embodiment of the present invention;

[0037]FIG. 2 shows a portion of a micromechanical pressure sensor as a second embodiment of the present invention;

[0038]FIGS. 3a, b show a portion of a micromechanical pressure sensor as a third embodiment of the present invention, in plan view in FIG. 3a and in section in FIG. 3b;

[0039]FIG. 4 shows an investigation of the relative hysteretic resistance change for a temperature loop from −40 to 140 degrees C., the aluminum patch lying above the compensating resistance in a long strip in the current direction;

[0040]FIG. 5 shows an investigation of the relative hysteretic resistance change for a temperature loop from −40 to 140 degrees C., the aluminum patch lying alongside the compensating resistance in a long strip in the current direction; FIG. 6 shows a portion of a micromechanical pressure sensor as a fourth embodiment of the present invention;

[0041]FIG. 7 is a plan view of a known pressure sensor;

[0042]FIG. 8 is a section through said known pressure sensor;

[0043]FIG. 9 shows the hysteresis of the mechanical stress as a function of temperature in a further known pressure sensor; and

[0044]FIG. 10 shows the hysteresis of the output signal of the further known pressure sensor as a function of membrane edge length, for various circuit inner radii.

DESCRIPTION OF EXEMPLIFIED EMBODIMENTS

[0045] In the Figures, identical reference characters denote identical or functionally identical elements.

[0046]FIG. 1 shows a portion of a micromechanical pressure sensor as a first embodiment of the present invention.

[0047] In FIGS. 1, 4a designates two longitudinal measuring resistances and 4 b two transverse measuring resistances, 60 designates patches made of conductor path material (in this case aluminum), 5 a designates two compensating resistances of the transverse measuring resistances and 5 b two compensating resistances of the longitudinal measuring resistances, V+ and V− designate supply potentials, and U designates an output voltage signal.

[0048] Be it noted that FIG. 1 is merely a schematic depiction of the circuit arrangement, and that measuring resistances 4 a, 4 b are located on the membrane whereas compensating resistances 5 a, 5 b and associated patches 60 are positioned on the surrounding region (support).

[0049] The general functional principle of the present first embodiment is to compensate for the hysteresis of the micromechanical pressure sensor by integrating compensating resistances 5 a, 5 b into the connecting line of measuring resistances 4 a, 4 b (approx. 80 micrometers outside the membrane). The compensating resistances are, for example, piezo-sensitive resistances of typically 200 ohms/square (size approx. 1 square, resistance approx. 200 ohms), that are connected in series with the measuring resistances. Aluminum patches 60 are located at a lateral spacing of typically 10 to 30 micrometers, perpendicular to compensating resistances 5 a and longitudinally with respect to compensating resistances 5 b.

[0050] Located between the resistance level in the substrate and the aluminum level is an insulation level, e.g. a SiO₂ layer, that has contact holes only at desired points and thus prevents unintentional short circuits.

[0051] Depending on the location of aluminum patches 60 with respect to compensating resistances 5 a, 5 b, the hysteretic stress difference acts perpendicular or parallel to the current direction. Since the longitudinal and transverse piezo coefficients have different signs, it is thereby possible to generate both positive and negative hystereses at compensating resistances 5 a, b. This is referred to here as “active hysteresis compensation.”

[0052] The hysteresis intensity induced for compensation purposes can be modified by way of the distance of aluminum patches 60 from compensating resistance 5 a, 5 b, and their shape and size.

[0053] The structure depicted in FIG. 1 exhibits limited effectiveness, however; in particular, the effectiveness is dependent on the particular sensor type.

[0054] As a result of this active hysteresis compensation using 200-ohm piezo-sensitive compensating resistances, the measurement bridge loses 10% of its sensitivity. This is critical especially in the low-pressure range. The sensitivity loss must be compensated for by enlarging the membrane. This results in an increase in nonlinearity, and increases both costs and the risk of buckling. A compensation system that operates without sensitivity loss, or with the least possible sensitivity loss, is therefore preferable.

[0055]FIGS. 2a, b show a portion of a micromechanical pressure sensor as a second embodiment of the present invention. This second embodiment concerns a passive compensation system for negative hysteresis with no sensitivity loss.

[0056] In FIGS. 2a, b, 70, 70′ designate respective electrically inactive metal patches made of aluminum which provide compensation utilizing the global effect.

[0057] If the spacing between the membrane edge and the circuit is >100 micrometers, the baseline hysteresis is negative (cf. FIG. 10). In this case the zero transition of the hysteresis can be implemented by way of an artificial decrease in the circuit inner radius. This is achieved by way of the additional conductor path material patches 70, 70′ at the edge of the circuit, which are electrically nonfunctional and are utilized exclusively because of their mechanical effect.

[0058] In the second embodiment, patches 70, 70′ are present in the form of a ring and are located on the surrounding region of membrane 10, i.e. between the circuit inner radius and the membrane edge. The ring can be completely continuous (compensation ring 70) or can be concentrated at the centers of the membrane edges, since the effect is greatest in this region (compensation ring 70′). In the latter case, there is more room in the corners for evaluation circuit 50.

[0059] The passive compensation system presented in this example has no influence on sensitivity. It does increase costs, however, since electrically inactive area is consumed. Alternatively, either a wide aluminum strip or many small strips can be used.

[0060] Although the influence of variation in the circuit inner radius is great, the aluminum edge can be produced to an accuracy of 1 micrometer (defined by photographic technology) and the overall result is nevertheless a very precise hysteresis compensation “adjustment screw.”

[0061]FIGS. 3a, b show a portion of a micromechanical pressure sensor as a third embodiment of the present invention. This third embodiment concerns a compensation system for positive hysteresis with the least possible sensitivity loss.

[0062] In FIGS. 3a, b, in addition to the reference characters already introduced, K1, K2, K3 designate low-resistance connecting line regions introduced into the substrate; 41, 42 designate measuring resistances; 100, 101, 102 designate conductor paths made of aluminum; and 51, 52, 53 and 51′, 52′, 53′ designate compensating resistances.

[0063] If the circuit inner radius is located so close to the edge that the hysteresis already lies in the positive region, an active hysteresis compensation system (i.e. compensating resistance connected to, e.g. in series with, the measuring resistance) must be activated. The most favorable arrangement is that in which the absolute value of the compensating resistance is as small as possible, but the hysteresis of the resistance value is as large as possible. Maximum compensation with minimum sensitivity loss is thereby achieved.

[0064] In the first exemplified embodiment, the respective 200-ohm compensating resistance 5 a, b is permanently installed into the overall bridge. This means a sensitivity loss of 10% even in cases where the compensation is not at all necessary, i.e. the relevant measuring resistance has no aluminum surrounding it.

[0065] It is more favorable to position the compensating resistances so that they become integrated into the Wheatstone bridge only when compensation is actually necessary. The structure proposed in accordance with the third exemplified embodiment comprises respective series of compensating resistances 51, 52, 53 and 51′, 52′, 53′ that can be connected, alternatively or together, in series with measuring resistances 41, 42. The resistance values are, for example, 2×90 ohms (51, 51′), 2×180 ohms (52, 52′), and 2×360 ohms (53, 53′). This corresponds e.g. to 0.5 square, 1 square, and 2 square of the baseline resistance. The total resistance to be activated is selected in such a way that it is sufficient for compensation.

[0066] If these compensating resistances 51, 52, 53 or 51′, 52′, 53′ are connected in series with a transverse measuring resistance 41, 42, they possess a compensatory effect for hysteresis in the negative direction. In the present case, only the 180 ohm (1 square) compensating resistance 52′ is connected. This can be done in the context of end-of-line measurement by removing superfluous conductor paths or adding desired ones (e.g. to create short circuits), or at the mask programming stage. In the latter case, precursor articles with test wafers are advisable.

[0067] The aforementioned sign applies to the instance in which aluminum is present longitudinally above the resistance. If the aluminum is located next to the resistance, the result is a compensatory effect in the positive direction (positive direction when compensating resistance is below aluminum in the longitudinal branch; negative direction when compensating resistance is alongside aluminum in longitudinal branch).

[0068]FIG. 3b schematically reproduces the layer structure of the embodiment in FIG. 3a. Here K designates the connecting line region plane that is located in the region of the resistance plane. 13 is an insulator plane, A11 a first conductor path plane, ZN an intermediate nitride plane, and A12 a second conductor plane for patches 60. Lastly, KL designates contact holes for connecting contact plane K to first conductor plane A11. A topmost protective plane made of nitride is not shown. The A11 conductor paths are short-circuited as necessary, thereby deactivating the corresponding resistances. If the resistances are required only for their electrical effect, A12 is entirely removed and A11 is removed over the resistances but remains as a contact connector.

[0069] Experiments have shown that it is more favorable to place a long aluminum strip directly over the resistance, since the hysteretic mechanical stresses are greater by a factor of 3 at the location of the resistance. It is thereby possible to generate relative hysteretic resistance changes of 1-1.2%, in contrast to the structures with lateral aluminum coating in which 0.3-0.4% is achievable.

[0070] This is illustrated in FIGS. 4 and 5: FIG. 4 shows an investigation of the relative hysteretic resistance change for a temperature loop from −40 to 140 degrees C., the aluminum patch lying above the compensating resistance in a long strip in the current direction; and FIG. 5 shows a similar investigation in which the aluminum patch lies longitudinally alongside the compensating resistance in a long strip in the current direction.

[0071] In FIG. 4, in addition to the reference characters already introduced, b designates the width of the aluminum conductor path, dzn the thickness of the intermediate nitride, dal the aluminum thickness, and dox the thickness of the insulator (here SiO₂) . Resistance R is created here by p-type diffusion into an n-type substrate.

[0072] As is evident from the depiction of the relative resistance change [Delta]R/R (indicator of hysteresis) plotted against b for different layer arrangements, the achievable effect has little dependency on b and has a magnitude of up to 1.2%.

[0073] In FIG. 5, in addition to the reference characters already introduced, x designates the distance of the aluminum conductor path from resistance R, d_(sn) the thickness of the protective nitride, and d_(a11/2) the aluminum thicknesses of the two conductor path layers.

[0074] As is evident from the depiction of the relative resistance change [Delta]R/R (indicator of hysteresis) plotted against b for different layer arrangements, at 90 degrees the achievable effect depends greatly on x and has a magnitude of only up to 0.45%. (The angles indicated refer to the angles formed by the compensating resistances with respect to the 100 direction, i.e. “90 degrees” means “parallel to the 110 direction.”)

[0075] Calculation of the expected hysteresis will be explained in more detail below.

[0076] An individual (e.g. longitudinal) resistance R_(L) comprising measuring resistance R_(Mess) and compensating resistance R_(comp) is defined by:

R _(L) =R _(Mess) +R _(comp)  (1)

[0077] Considering the temperature dependency of the semiconductor resistance and the piezo effect, the measuring resistance can be expressed as $\begin{matrix} {R_{Mess} = {{R_{Mess}(T)} + {\frac{\Delta \quad R_{Mess}}{R_{Mess}(T)}{R_{Mess}(T)}}}} & (2) \end{matrix}$

[0078] where R_(Mess)(T) describes the linear and quadratic temperature profile of the baseline resistance:

R _(Mess)(T)=R ₀ +TKR*ΔT+TK2R*ΔT ²  (3)

[0079] and TKR and TKR2 are corresponding constants.

[0080] ΔR_(Mess)results from the piezo effect: $\begin{matrix} {\frac{\Delta \quad R_{Mess}}{R_{Mess}(T)} = {{\pi_{L}\sigma_{L}\quad {where}\quad {{temp}.}} = {{const}.}}} & (4) \end{matrix}$

[0081] This variable is accessible instrumentally, and the change is on the order of approx. 2%. R_(Mess)(T) changes by approx. 20% over the entire temperature profile.

[0082] The mechanical stress σ_(L) is brought about by the compressive deformation σ_(L) (p) of the membrane under a pressure p and by thermally induced deformations σ_(L) (T). The resulting equation is:

σ_(L)+σ_(L)(p)+σ_(L)(T)  (5)

[0083] A similar equation governs the transverse resistance R_(T).

[0084] The equation for the compensating resistance R_(comp) required is: $\begin{matrix} {R_{comp} = {{R_{\quad {comp}}(T)} + {\frac{\Delta \quad R_{comp}}{R_{c\quad {omp}}(T)}{R_{comp}(T)}}}} & (6) \end{matrix}$

[0085] where $\frac{\Delta \quad R_{comp}}{R_{comp}(T)} = {\pi_{L}\sigma_{T}}$

[0086] The mechanical stress with rising temperature is perpendicular to the current direction if the metal strip covers the resistance longitudinally. In contrast to the measuring resistance, only one temperature dependency exists, i.e.:

σ_(T)=σ_(T)(T)  (7)

[0087] As stated by the equation $\begin{matrix} {U_{out} = {U_{Vers}\frac{\left( {1 + \frac{\Delta \quad R_{T}}{R_{T}}} \right)^{2} - \left( {1 + \frac{\Delta \quad R_{L}}{R_{L}}} \right)^{2}}{\left( {2 + \frac{\Delta \quad R_{T}}{R_{T}} + \frac{\Delta \quad R_{L}}{R_{L}}} \right)^{2}},}} & (8) \end{matrix}$

[0088] a difference between the transverse and longitudinal resistance causes a signal at the bridge output. In order to compensate the hysteresis to zero, the transverse and longitudinal resistances must possess the same hysteresis over temperature. The hysteresis without compensation resulting from equation (8) is depicted in FIG. 10.

[0089] The effect of the compensation structure was calculated using the equations provided above, entering hysteretic mechanical stresses based on simulations. A value of 0.2 MPa was used at the location of the measuring resistances. This results, by calculation, in a bridge hysteresis of 0.5%. A remanent stress of 10 MPa (simulations) was assumed for the location of the compensating resistances, i.e. beneath A11 and A12. This results, by calculation, in a hysteresis of 0.5%. The mechanical stresses due to pressure-related membrane deformation were also ascertained by simulation, and are on the order of 30 MPa. The pressure dependency of the hysteresis was also taken into account in the simulations, but is not discussed further in this Application. This pressure dependency causes the hysteresis curves to spread apart. The result in the calculation example was a compensating resistance per branch of 140 ohms in order to push the total hysteresis below 1 mV.

[0090] Although a 140-ohm resistance does not directly exist in the arrangement as shown in FIG. 3a, it can be achieved approximately by a combination in which a 90-ohm resistance is incorporated into the branch of the one transverse resistance, and a 180-ohm resistance into the branch of the second transverse resistance.

[0091] In the example, it was initially assumed that both the A11 and the A12 plane are used. In this case the maximum achievable hysteretic stress (remanent stress) beneath the aluminum strips, i.e. at the location of the compensating resistance, is 10 MPa. If only the A11 plane is used, the stress is approx. one-third of that value. This corresponds to a relative hysteretic resistance change of 0.3-0.4%, as opposed to 1-1.2% if the A11 and A12 planes are used.

[0092] Therefore, if only the A11 plane is placed over the compensating resistances, the compensation effect is reduced to a third; the most-precise compensation effect is less than 0.1% of the bridge hysteresis.

[0093] If the 90-ohm as well as the 180-ohm and 360-ohm resistances are activated before each transverse resistance in both branches, a potential compensation effect of 4.5% bridge hysteresis is possible.

[0094] In order to ensure symmetry of the bridge (offset), a corresponding resistance is additionally connected in the branch of the longitudinal resistance. This resistance is not, however, equipped with a metal surround. Electrical symmetry thus results.

[0095] A further increase in the compensation effect can of course be achieved if the compensating resistances of the longitudinal measuring resistances are designed with metal strips lying laterally alongside them. Since the effect, as stated above, is less by a factor of approx. 3, an increase in the potential total compensation from 4.5% to 6% is thereby possible.

[0096]FIG. 6 shows a portion of a micromechanical pressure sensor as a fourth embodiment of the present invention.

[0097] In this fourth embodiment, a hysteresis compensation takes place directly at the measuring resistance, i.e. aluminum patches 60 are arranged so that they lie directly on measuring resistances 41, 42. This permits compensation even if a positive baseline hysteresis already exists in the context of the original circuit inner radius (i.e. the circuit is already too close to the membrane edge). With a longitudinal resistance (=edge effect predominant, i.e. compressive stress perpendicular to the current direction), a compensation strip 60 would be placed longitudinally on the resistance, since it also produces a compressive stress but parallel to the current direction.

[0098] As stated by the equation $\frac{\Delta \quad R}{R} = {{\pi_{l}\sigma} + {\pi_{t}\sigma_{t}{\quad,}}}$

[0099] the two changes act in opposite directions.

[0100] Although the micromechanical component according to the present invention has been described above with reference to preferred exemplified embodiments, it is not limited thereto but rather is modifiable in many ways.

[0101] In general, hysteresis compensation can be performed in different ways. On the one hand it can occur by mask programming, e.g. by way of the contact and metal planes. As they come from the factory, the resistances are located beneath the oxide and are thus guaranteed inactive. They are connected only as necessary.

[0102] On the other hand, this can be accomplished for test purposes by focused ion beam (FIB) cutting or using burnout segments or by thyristor zapping or oxide zapping. For test purposes, the structure is laid out on test chips so that the compensating resistances can be connected by FIB cutting. This makes possible rapid optimization on the configured sensor.

[0103] The equalization structures can also be integrated into the circuit portion. This is in fact advantageous if there is any influence on the compensating resistances by the membrane edge. 

What is claimed is:
 1. A micromechanical component, in particular a pressure sensor, comprising a substrate (2) that has a membrane region (10) and a surrounding region of the membrane region (10); at least one measuring resistance (4 a, 4 b; 41, 42) provided in the membrane region (10) and modifiable by deformation of the membrane region (10); a corresponding evaluation circuit (50) provided in the surrounding region, an interference effect on the measuring resistance (4 a, 4 b; 41, 42) being producible by way of a deformation of parts, in particular conductor paths, of the evaluation circuit (50) relative to the substrate (2); and at least one patch (60; 70, 70′) provided in the surrounding region and/or in the membrane region (10) and made of a material such that by way of a deformation of the patch or patches (60) relative to the substrate (2), an analog interference effect can be generated in such a way that the interference effect acting on the measuring resistance (4 a, 4 b; 41, 42) can be compensated for.
 2. The micromechanical component as defined in claim 1, wherein a compensating resistance device is provided which is configured such that one or more compensating resistances can be additionally connected to the measuring resistance (4 a, 4 b; 41, 42), respective patches (60) being provided in the region of the compensating resistances (5 a, 5 b; 51, 52, 53, 51′, 52′, 53′).
 3. The micromechanical component as defined in claim 2, wherein additional connection of the compensating resistance or resistances (5 a, 5 b; 51, 52, 53, 51′, 52′, 53′) can be performed selectably, so that from a defined number of compensating resistances, a specific combination that is to be additionally connected to the measuring resistance is selectable.
 4. The micromechanical component as defined in claim 1, 2, or 3, wherein one or more patches (60) that act directly on the measuring resistance (41, 42) are provided in the membrane region (10).
 5. The micromechanical component as defined in one of the foregoing claims, wherein one or more preferably annular patches (70, 70′), which are located in the surrounding region between the membrane edge (15) and the circuit inner radius of the evaluation circuit (50), are provided.
 6. The micromechanical component as defined in one of the foregoing claims, wherein the material of the patches (60; 70, 70′) is the conductor path material of the evaluation circuit (50).
 7. The micromechanical component as defined in one of the foregoing claims, wherein the patches (60) are located above or alongside an associated compensating resistance (5 a, 5 b; 51, 52, 53, 51′, 52′, 53′).
 8. The micromechanical component as defined in one of the foregoing claims, wherein the substrate material is silicon and the conductor path material is aluminum.
 9. An equalization method for a micromechanical component as defined in claim 3, the additional connection being optimized on a test chip.
 10. An equalization method for a micromechanical component as defined in claim 3, the additional connection being optimized in a final individual equalization. 